Exploration of complex multilayer film growth morphologies: STM analysis and predictive atomistic modeling for Ag on Ag(111)

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2008-01-01
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Chung, P.-W.
Cox, E.
Jenks, Cynthia
Thiel, Patricia
Evans, James
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Evans, James
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Materials Science and Engineering
Materials engineers create new materials and improve existing materials. Everything is limited by the materials that are used to produce it. Materials engineers understand the relationship between the properties of a material and its internal structure — from the macro level down to the atomic level. The better the materials, the better the end result — it’s as simple as that.
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Mathematics
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Ames National LaboratoryMaterials Science and EngineeringMathematicsChemistry
Abstract

Scanning tunneling microscopy studies are integrated with development of a realistic atomistic model to both characterize and elucidate the complex mounded morphologies formed by deposition of Ag on Ag(111) at 150 and 180 K. Threefold symmetric lateral shapes of islands and mounds are shown to reflect the influence of a nonuniform step edge barrier inhibiting interlayer transport. Modeling of structure at the mound peaks leads to a sensitive estimate of the magnitude of this large barrier.

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This article is from Physical Review B 77, no. 3 (2008): 033402, doi:10.1103/PhysRevB.77.033402.

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Tue Jan 01 00:00:00 UTC 2008
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