Selective etching process
Date
1994-09-20
Authors
Braymen, Steven
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Iowa State University Research Foundation, Inc.
The Iowa State University Research Foundation (ISURF) seeks to protect the intellectual property (including new discoveries, technologies, or creative works) of the university's students & faculty which is continuously created through research and other undertakings. It seeks to manage, protect, and own all intellectual property on behalf of the university. The Iowa State University Research Foundation was created in 1938.
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Abstract
A process for selectively etching silicon comprises preparing a solution of etchant which is a non-selective etch for at least silicon and aluminum. The prepared solution is preconditioned by adding atomic silicon to the solution and aging the solution after the addition of silicon for at least 30 minutes. Then, silicon substrates carrying aluminum are immersed in the preconditioned solution to etch the silicon while leaving the aluminum substantially unaffected.