Chemistry, Mathematics, Ames Laboratory
Journal or Book Title
Physical Review B
Exposure of Ag/Ag(100) thin films to molecular oxygen (O2) at 220–250 K is shown to activate low-temperature coarsening of submonolayer island distributions, and a smoothing of multilayer films with “mounded” morphologies. Dissociation of O2 at kink sites populates step edges with atomic oxygen (O), modifying the step-edge energetics, and facilitating Ostwald ripening of film nanostructures. We propose that ripening occurs by “easy” detachment and terrace diffusion of an AgnO species. Cluster diffusion does not play a significant role, contrasting with the O-free system.
American Physical Society
Layson, Anthony R.; Evans, James W.; and Thiel, Patricia A., "Additive-enhanced coarsening and smoothening of metal films: Complex mass-flow dynamics underlying nanostructure evolution" (2002). Chemistry Publications. 57.