Campus Units

Chemistry, Mathematics, Ames Laboratory

Document Type

Article

Publication Date

2002

Journal or Book Title

Physical Review B

Volume

65

Issue

19

First Page

193409

DOI

10.1103/PhysRevB.65.193409

Abstract

Exposure of Ag/Ag(100) thin films to molecular oxygen (O2) at 220–250 K is shown to activate low-temperature coarsening of submonolayer island distributions, and a smoothing of multilayer films with “mounded” morphologies. Dissociation of O2 at kink sites populates step edges with atomic oxygen (O), modifying the step-edge energetics, and facilitating Ostwald ripening of film nanostructures. We propose that ripening occurs by “easy” detachment and terrace diffusion of an AgnO species. Cluster diffusion does not play a significant role, contrasting with the O-free system.

Comments

This article is from Physical Review B 65, no. 19 (2002): 193409, doi:10.1103/PhysRevB.65.193409.

Copyright Owner

American Physical Society

Language

en

File Format

application/pdf

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