Document Type

Patent

Publication Date

4-29-2003

Abstract

A method of manufacturing photonic band gap structures operable in the optical spectrum has been presented. The method comprises the steps of creating a patterned template for an elastomeric mold, fabricating an elastomeric mold from poly-dimethylsiloxane (PDMS) or other suitable polymer, filling the elastomeric mold with a second polymer such as epoxy or other suitable polymer, stamping the second polymer by making contact with a substrate or multilayer structure, removing the elastomeric mold, infiltrating the multilayer structure with ceramic or metal, and heating the multilayer structure to remove the second polymer to form a photonic band gap structure.

Patent Number

US 6,555,406 B1

Assignee

Iowa State University Research Foundation, Inc.

Application Number

US 10/081,729

Date Filed

2-22-2002

Language

en

File Format

application/pdf

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