Document Type

Article

Publication Date

7-9-2001

Journal or Book Title

Applied Physics Letters

Volume

79

Issue

2

First Page

227

Last Page

229

DOI

10.1063/1.1385186

Abstract

Growth of MgB2thin films by pulsed laser deposition is examined under ex situ and in situprocessing conditions. For the ex situ process, boronfilmsgrown by pulsed laser deposition were annealed at 900 °C with excess Mg. For the in situ process, different approaches involving ablation from a stoichiometric target under different growth conditions, as well as multilayer deposition involving interposed Mg layers were examined and analyzed. Magnetic measurements on ex situ processed films show Tc of ∼39 K, while the current best in situfilms show a susceptibility transition at ∼22 K.

Comments

The following article appeared in Applied Physics Letters 79 (2001): 227 and may be found at http://dx.doi.org/10.1063/1.1385186.

Rights

Copyright 2001 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

Copyright Owner

American Institute of Physics

Language

en

File Format

application/pdf

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