Campus Units

Chemistry, Ames Laboratory

Document Type

Conference Proceeding

Conference

SPIE Conference on Environmental Monitoring and Remediation Technologies II

Publication Version

Published Version

Publication Date

12-21-1999

Journal or Book Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

3853

First Page

213

Last Page

220

DOI

10.1117/12.372855

Conference Title

Environmental Monitoring and Remediation Technologies II

Conference Date

September 1999

City

Boston, Massachusetts

Abstract

An air-inductively coupled plasma (air-ICP) system has been developed for continuous sampling and monitoring of metals as a continuous emission monitor (CEM). The plasma is contained in a metal enclosure to allow reduced-pressure operation. The enclosure and plasma are operated at a pressure slightly less than atmospheric using a Roots blower, so that sample gas is continuously drawn into the plasma. A Teflon sampling chamber, equipped with a sampling pump, is connected to the stack that is to be monitored to isokinetically sample gas from the exhaust line and introduce the sample into the air-ICP. Optical emission from metals in the sampled gas stream is detected and monitored using an acousto-optic tunable filter (AOTF) - echelle spectrometer system. A description of the continuous sampling air-ICP system is given, along with some preliminary laboratory data for continuous monitoring of metals.

Comments

This article is from Proceedings of SPIE - The International Society for Optical Engineering 3853 (1999): 213, doi: 10.1117/12.372855.

Rights

This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Language

en

File Format

application/pdf

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