Document Type
Article
Publication Date
3-15-1990
Journal or Book Title
Physical Review B
Volume
41
Issue
8
First Page
5410
Last Page
5413
DOI
10.1103/PhysRevB.41.5410
Abstract
We present a different mechanism to explain the occurrence of long-lived oscillations in diffraction spot intensities during epitaxial growth of metal films on fcc (100) substrates at low temperature. Rather than rely on the common picture of cyclical nucleation and growth to produce the oscillations, the model invokes ‘‘downward funneling’’ deposition dynamics to fourfold-hollow adsorption sites.
Copyright Owner
American Physical Society
Copyright Date
1990
Language
en
File Format
application/pdf
Recommended Citation
Evans, James W.; Sanders, D. E.; Thiel, Patricia A.; and DePristo, Andrew E., "Low-temperature epitaxial growth of thin metal films" (1990). Chemistry Publications. 73.
https://lib.dr.iastate.edu/chem_pubs/73
Comments
This article is from Physical Review B 41, no. 8 (1990): 5410–5413, doi:10.1103/PhysRevB.41.5410.