FEFIIT is a unique method, which can be utilized to imprint complex structures on the surface of a conducting substrate. Experimental results have shown that under certain conditions, it is possible to obtain surface structures with characteristic length smaller than that of the mask. DC chopped simulations in particular yield unique features, which can be exploited to yield high aspect ratio structures. In this thesis, a model of this process is established and studied. Studies are conducted on the various length scale parameters as well as the starting concentration, and the potential applied. Two independent dimensionless parameters are found to profoundly affect the shape of the surface structure formed. Further, a qualitative reasoning for the DC chopped simulations are provided.