Document Type
Article
Publication Date
6-1-2001
Journal or Book Title
Journal of Applied Physics
Volume
89
Issue
11
First Page
7009
Last Page
7011
DOI
10.1063/1.1363604
Abstract
A micromagnetic model has been developed for investigating the effect of stress on the magnetic properties of thin films. This effect has been implemented by including the magnetoelastic energy term into the Landau–Lifshitz–Gilbert equation. Magnetization curves of a nickelfilm were calculated under both tensile and compressive stresses of various magnitudes applied along the field direction. The modeling results show that coercivity increased with increasing compressive stress while remanence decreased with increasing tensile stress. The results are in agreement with the experimental data in the literature and can be interpreted in terms of the effects of the applied stress on the irreversible rotation of magnetic moments during magnetization reversal under an applied field.
Rights
Copyright 2001 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Copyright Owner
American Institute of Physics
Copyright Date
2001
Language
en
File Format
application/pdf
Recommended Citation
Zhu, B.; Lo, Chester C.H.; Lee, S. J.; and Jiles, David C., "Micromagnetic modeling of the effects of stress on magnetic properties" (2001). Materials Science and Engineering Publications. 107.
https://lib.dr.iastate.edu/mse_pubs/107
Comments
The following article appeared in Journal of Applied Physics 89 (2001): 7009 and may be found at http://dx.doi.org/10.1063/1.1363604.