Document Type
Article
Publication Date
3-21-2011
Journal or Book Title
Inorganic Chemistry
Volume
50
Issue
6
First Page
2143
Last Page
2150
DOI
10.1021/ic101448m
Abstract
In this study, lithium thio-germanate thin film electrolytes have been successfully prepared by radio frequency (RF) magnetron sputtering deposition in Ar gas atmospheres. The targets for RF sputtering were prepared by milling and pressing appropriate amounts of the melt-quenched starting materials in the nLi2S + GeS2 (n = 1, 2, and 3) binary system. Approximately 1 μm thin films were grown on Ni coated Si (Ni/Si) substrates and pressed CsI pellets using 50 W power and 25 mtorr (3.3 Pa) Ar gas pressures to prepare samples for Raman and Infrared (IR) spectroscopy, respectively. To improve the adhesion between the silicon substrate and the thin film electrolyte, a sputtered Ni layer (120 nm) was used. The surface morphologies and thickness of the thin films were determined by field emission scanning electron microscopy (FE-SEM). The structural properties of the starting materials, target materials, and the grown thin films were examined by X-ray diffraction (XRD), Raman, and IR spectroscopy.
Copyright Owner
American Chemical Society
Copyright Date
2011
Language
en
File Format
application/pdf
Recommended Citation
Seo, Inseok and Martin, Steve W., "Structural Properties of Lithium Thio-Germanate Thin Film Electrolytes Grown by Radio Frequency Sputtering" (2011). Materials Science and Engineering Publications. 42.
https://lib.dr.iastate.edu/mse_pubs/42
Comments
Reprinted with permission from Inorganic Chemistry 50 (2011): 2143–2150, doi:10.1021/ic101448m. Copyright 2011 American Chemical Society.