Document Type

Article

Publication Date

1-25-2011

Journal or Book Title

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volume

10

Issue

1

First Page

013011

DOI

10.1117/1.3541794

Abstract

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

Comments

This article is from Journal of Micro/Nanolithography, MEMS, and MOEMS 10 (2011): 013011, doi:10.1117/1.3541794. Posted with permission.

Rights

Copyright 2011 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Copyright Owner

SPIE

Language

en

File Format

application/pdf

Share

COinS