Campus Units

Physics and Astronomy, Mathematics, Ames Laboratory

Document Type

Article

Publication Version

Published Version

Publication Date

1993

Journal or Book Title

Physical Review B

Volume

47

Issue

20

First Page

891

Last Page

894

DOI

10.1103/PhysRevB.47.13891

Abstract

Diffusion-mediated nucleation and growth of islands during deposition occurs essentially irreversibly in a variety of systems. We provide a scaling theory for the full island-size distribution, both with the ratio of surface diffusion to deposition rates and with time. Scaling functions and exponents are determined by simulation and explained analytically by an unconventional rate-equation analysis. Experimental tests for theoretical predictions are discussed, including the scaling of superlattice beam profiles for diffraction studies of heteroepitaxial systems.

Comments

This article is published as Bartelt, M. C., M. C. Tringides, and J. W. Evans. "Island-size scaling in surface deposition processes." Physical Review B 47, no. 20 (1993): 13891, doi:10.1103/PhysRevB.47.13891. Posted with permission.

Copyright Owner

American Physical Society

Language

en

File Format

application/pdf

Share

COinS