Campus Units

Physics and Astronomy, Mathematics, Ames Laboratory

Document Type

Article

Publication Version

Published Version

Publication Date

12-7-2016

Journal or Book Title

The Journal of Chemical Physics

Volume

145

Issue

21

First Page

211904

DOI

10.1063/1.4954410

Abstract

Point island models (PIMs) are presented for the formation of supported nanoclusters (or islands) during deposition on flat crystalline substrates at lower submonolayer coverages. These models treat islands as occupying a single adsorption site, although carrying a label to track their size (i.e., they suppress island structure). However, they are particularly effective in describing the island size and spatial distributions. In fact, these PIMs provide fundamental insight into the key features for homogeneous nucleation and growth processes on surfaces. PIMs are also versatile being readily adapted to treat both diffusion-limited and attachment-limited growth and also a variety of other nucleation processes with modified mechanisms. Their behavior is readily and precisely assessed by kinetic Monte Carlo simulation.

Comments

This article is published as Han, Yong, Émilie Gaudry, Tiago J. Oliveira, and James W. Evans. "Point island models for nucleation and growth of supported nanoclusters during surface deposition." The Journal of Chemical Physics 145, no. 21 (2016): 211904, doi:10.1063/1.4954410. Posted with permission.

Copyright Owner

American Institute of Physics

Language

en

File Format

application/pdf

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