Presenter Information

Marc A. Taubenblatt, IBM

Location

La Jolla, CA

Start Date

1-1-1989 12:00 AM

Description

Numerous photothermal displacement techniques have been developed [1–5] to obtain both thermal and spectroscopic information about substrates and thin films. These techniques rely on interferometry or beam deflection phenomena to measure thermal displacements or gradients in those displacements. The use of phase microscopy (a small spot interferometer) [6–8] to measure surface displacements is advantageous in that it allows such displacements to be measured over a diffraction limited optical spot, typically 1 µm. In addition, typical arrangements provide for both reference and signal beams to reflect from the same substrate thereby allowing a near common path and rejection of many major noise sources (vibration, air turbulence and thermal fluctuation).

Volume

8B

Chapter

Chapter 6: Electronic Materials and Devices

Section

Electronic Materials and Devices

Pages

1203-1210

DOI

10.1007/978-1-4613-0817-1_150

Language

en

File Format

application/pdf

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Jan 1st, 12:00 AM

Applications of Phase Microscopy to Photothermal Spectroscopy

La Jolla, CA

Numerous photothermal displacement techniques have been developed [1–5] to obtain both thermal and spectroscopic information about substrates and thin films. These techniques rely on interferometry or beam deflection phenomena to measure thermal displacements or gradients in those displacements. The use of phase microscopy (a small spot interferometer) [6–8] to measure surface displacements is advantageous in that it allows such displacements to be measured over a diffraction limited optical spot, typically 1 µm. In addition, typical arrangements provide for both reference and signal beams to reflect from the same substrate thereby allowing a near common path and rejection of many major noise sources (vibration, air turbulence and thermal fluctuation).