Location

Brunswick, ME

Start Date

1-1-1990 12:00 AM

Description

Semiconductor processing temperatures are currently measured using either pyrometers or thermocouples, both of which have significant limitations. Temperature measurements based on the temperature dependance of the Lamb wave velocities in silicon and longitudinal waves through the ambient directly above the wafer are explored.

Book Title

Review of Progress in Quantitative Nondestructive Evaluation

Volume

9B

Chapter

Chapter 6: Electronic and Ceramic Materials

Pages

1109-1114

DOI

10.1007/978-1-4684-5772-8_141

Language

en

File Format

application/pdf

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Jan 1st, 12:00 AM

Temperature Measurement of Silicon Wafers Using Photoacoustic Techniques

Brunswick, ME

Semiconductor processing temperatures are currently measured using either pyrometers or thermocouples, both of which have significant limitations. Temperature measurements based on the temperature dependance of the Lamb wave velocities in silicon and longitudinal waves through the ambient directly above the wafer are explored.