Location

La Jolla, CA

Start Date

1-1-1991 12:00 AM

Description

The manufacture of optical coatings, computer disks, as well as advanced electronic multilayered devices and circuit structures requires high precision in the measurement and control of thicknesses and interfacial and surface roughnesses. Variable angle spectroscopic ellipsometry (VASE) is non-destructive and monolayer sensitive. VASE uses polarized light, and the technique can be applied in nearly any ambient, including air, vacuum, or corrosive environment. Applications to coated window glass, space protective coatings, semiconductor device, as well as sputtered media computer disk manufacturing are discussed. At the present time these NDE measurements are mainly ex situ, but in situ (during deposition) applications are being rapidly developed.

Book Title

Review of Progress in Quantitative Nondestructive Evaluation

Volume

10B

Chapter

Chapter 9: Manufacturing and Reliability

Pages

2185-2191

DOI

10.1007/978-1-4615-3742-7_138

Language

en

File Format

application/pdf

Included in

Manufacturing Commons

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Jan 1st, 12:00 AM

Non-Destructive Evaluation in Manufacturing using Spectroscopic Ellipsometry

La Jolla, CA

The manufacture of optical coatings, computer disks, as well as advanced electronic multilayered devices and circuit structures requires high precision in the measurement and control of thicknesses and interfacial and surface roughnesses. Variable angle spectroscopic ellipsometry (VASE) is non-destructive and monolayer sensitive. VASE uses polarized light, and the technique can be applied in nearly any ambient, including air, vacuum, or corrosive environment. Applications to coated window glass, space protective coatings, semiconductor device, as well as sputtered media computer disk manufacturing are discussed. At the present time these NDE measurements are mainly ex situ, but in situ (during deposition) applications are being rapidly developed.