Noncontacting Photothermal Radiometry of MOS Capacitor Structures: The Frequency-Domain and DLTS Approaches
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Begun in 1973, the Review of Progress in Quantitative Nondestructive Evaluation (QNDE) is the premier international NDE meeting designed to provide an interface between research and early engineering through the presentation of current ideas and results focused on facilitating a rapid transfer to engineering development.
This site provides free, public access to papers presented at the annual QNDE conference between 1983 and 1999, and abstracts for papers presented at the conference since 2001.
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Abstract
The measurements of photoexcited excess carrier lifetime and activation energies in a semiconductor are useful in the characterization of the quality of semiconductor materials and in evaluating the performance of working semiconductor devices. The noncontact method of photothermal infrared radiometry (PTR), with both frequency-domain (PTR-FD) [1–3] and rate-window (PTR-RW) [4,5] detection configurations has been shown to be promising for remote on-line or off-line impurity/electronic defect diagnostics. A new PTR deep-level transient spectroscopy (PTR-DLTS) which combines the PTR-RW with semiconductor temperature ramping has been developed recently [6] and found to possess high spectral peak separation and spatial resolution.