Degree Type

Dissertation

Date of Award

2008

Degree Name

Doctor of Philosophy

Department

Chemical and Biological Engineering

First Advisor

Andrew C. Hillier

Second Advisor

Kurt R. Hebert

Third Advisor

Brent H. Shanks

Abstract

This work describes a systematic approach to study chemical reactions of copper in contact with various chemical agents and to construct a coherent etching rate model based on the fundamental chemistry. Reactions of copper with chemical agents were investigated by in-situ real time technique, quartz crystal microgravimetry (QCM). Kinetic processes were followed by QCM measurement and analyzed. A coherent etching rate formula was built based on the kinetic analysis of fundamental reactions. The requirement of repeated experiments for studying copper chemistry motivated us to develop a high throughput measurement system. We utilized surface plasmon resonance (SPR) imaging combined with multi flow channel or multi electrode for high throughput design. Fundamental physics of SPR technique and instrumental design will be provided in detail. We expect this study has an impact on relatively advanced area that utilizes copper, such as chemical mechanical polishing (CMP) in semiconductor process.

DOI

https://doi.org/10.31274/rtd-180813-17060

Publisher

Digital Repository @ Iowa State University, http://lib.dr.iastate.edu/

Copyright Owner

Changhoon Choi

Language

en

Proquest ID

AAI3296792

OCLC Number

231345380

ISBN

9780549423331

File Format

application/pdf

File Size

169 pages

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